Product Code: PIC2008_M805

Design and Experimental Realization of 3D Photonic Components Via Two-Photon Polymerization
Authors:
Andre Neumeister, Laser Zentrum Hannover; Hannover Germany
Andrei Lavrinenko, Technical University of Denmark; Lyngby Denmark
Johannes Zinn, Laser Zentrum Hannover; Hannover Germany
Mark Boyle, Laser Zentrum Hannover E.V.; Hannover Germany
Rainer Kling, Laser Zentrum Hannover E.V.; Hannover Germany
Reinhold J. Leyrer, Basf Aktiengesellschaft; Ludwigshafen Germany
Wendel Wohlleben, Basf Aktiengesellschaft; Ludwigshafen Germany
Roman Kiyan, Laser Zentrum Hannover E. V. ; Hannover Germany
Presented at PICALO 2008

The use of light as an information carrier is rapidly increasing. To fully exploit the advantages of this technology, the production of 3D photonic circuits is necessary. The inscription of defined defects by two-photon polymerization (TPP) of a photoresist infiltrated in 3D photonic bandgap templates has been identified as possible technique to fabricate 3D photonic components and circuits. The TPP technique provides a platform to write 3D structures with features as small as 200 nm, which is sufficiently small for components operating in the infrared telecommunication windows. The design of these defects for the production of passive components, such as waveguides, as well as the precise experimental achievement, is critical for the components functionality. Numerical simulation provides insight into the operational performance of the photonic component. This presentation will focus on the experimental inscription of defects by TPP for the production of straight wave guides in opal templates. In addition, simulation of the designed waveguides will be presented.