Product Code: ILSC2011_C102

Proposed Changes of the Retinal Thermal MPEs (Closing Plenary, 30 minutes)
Authors:
Karl Schulmeister, Seibersdorf Laboratories; Seibersdorf Austria
Presented at ILSC 2011

ICNIRP is about to update the laser exposure limits, which are in parallel adopted by IEC for IEC 60825-1. ANSI is likely to update their exposure limits in a similar form. The exposure limits (and consequently AEL for classification) will be partially raised, allowing higher exposure and emission (wavelength dependence close to 1400 nm, extended spots, multiple pulse reduction), and partially it is necessary to lower the limits (basic limit in the nanosecond range). An overview will be given of the intended changes and their potential impact on risk analysis for exposure and safety classification of products, respectively. It depends on the combination of the parameters wavelength, pulse duration, repetition rate and source size if the net effect of the changes are to lower the allowed exposure or emission, or to raise it.