Product Code: ICA10_P199

Laser Parallel Micro/Nano Patterning of Hydrophobic Surfaces in Optical Near Fields
Authors:
Ashfaq Khan, Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester; Manchester Great Britain
Zengbo Wang, Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester; Manchester Great Britain
Mohammad A Sheikh, Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester; Manchester Great Britain
David J Whitehead, Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester; Manchester Great Britain
Lin Li, Laser Processing Research Centre, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester; Manchester Great Britain
Presented at ICALEO 2010

Although Laser surface micro/nanopatterning by using Contact Particles Lens Array (CPLA) has been extensively utilized, no suitable technique has yet been available for deposition of CPLA on Hydrophobic surfaces. In this paper a novel technique for patterning of hydrophobic surfaces is proposed and demonstrated.
For the deposition of CPLA, conventional techniques necessarily require the surface to be hydrophilic. The proposed technique, on the other hand could deposit CPLA on both hydrophilic and hydrophobic surfaces. In this technique, a hexagonal closed pack monolayer of SiO2 spheres is first formed by self assembly on a flat, smooth and hydrophilic glass surface. The formed monolayer of particles is then picked up by a flexible sticky surface and placed on the hydrophobic surface to be patterned thereby effectively covering the hydrophobic Silicon (Si) surface with a CPLA. A 532 nm wavelength Nd:YVO4 laser is then used to irradiate the substrate with the laser passing through the flexible surface and the particles. Experimental investigations have been carried out to determine the properties of the patterns. Moreover, the optical near field around the particles has been numerically simulated using the Finite Integral Technique (FIT).