Product Code: ICA10_M202

High-Speed Ablation Processes with Nanosecond and Picosecond Lasers (Invited Presentation)
Authors:
Severin Massa, TRUMPF Laser GmbH + Co. KG; Schramberg Germany
Simone Russ, TRUMPF Laser GmbH + Co. KG; Schramberg Germany
Rene Siebert, Technische Universitaet Dresden; Dresden Germany
Birgit Faisst, TRUMPF Laser - und Systemtechnik GmbH; Ditzingen Germany
Sascha Weiler, TRUMPF Laser - und Systemtechnik GmbH; Ditzingen Germany
Juergen Stollhof, TRUMPF Inc.; Farmington CT USA
Presented at ICALEO 2010

Shorter pulse widths are required to improve quality of many ablation processes. In the lower nanosecond pulse width regime, the ratio of vaporization to fusion is increased. With picosecond pulse widths, sublimation is the dominant effect.
Vaporization needs a significantly higher energy than fusion and can therefore decrease productivity. Absorption on the interface between a substrate and a layer can create vapor in between those two materials which will blast off the layer. A high ratio of vaporization to fusion increases quality. Short nanosecond or picosecond lasers are needed.