Product Code: ICAL06_M304

Patterning of ITO on Glass with Picosecond Lasers for OLEDs
Authors:
Gediminas Raciukaitis, Institute of Physics, Vilnius; Vilnius Lithuania
Gediminas Darcianovas, Institute of Physics; Vilnius Lithuania
Marijus Brikas, Institute of Physics; Vilnius Lithuania
Mindaugas Gedvilas, Institute of Physics; Vilnius Lithuania
Presented at ICALEO 2006

Laser direct write technology has been widely used for patterning indium-tin oxide (ITO). It is the main material for making transparent electrodes in electronic devices and flat panel displays. Organic electronics imposes special requirements on geometrical and electrical quality of conductors. Radiation of a high repetition rate picosecond laser was applied to pattern the conductor matrix in ITO layer on glass for OLEDs. Impact of wavelength, laser fluence and pulse overlap was studied. Profile of the trenches was analyzed with a phase contrast optical microscope, a stylus type profiler, SEM and AFM. UV radiation at the 266 nm provides quite a wide working window for ITO ablation without damage of the substrate. Use of fluences close to the ablation threshold made it possible to minimize the surface contamination during the process and recast ridge formation. The latter is specifically important to prevent shortcut formation in OLED devices.