Product Code: ICAL05_M502

Measuring UV?Laser in Focus within a Few Seconds - Basic for Laser Micro Manufacturing
Authors:
Harald Schwede, PRIMES GmbH; Pfungstadt Germany
Otto Maerten, MOC; Dreieich Germany
Reinhard Kramer, PRIMES GmbH; Pfungstadt Germany
Stefan Wolf, PRIMES GmbH; Pfungstadt Germany
Volker Brandl, PRIMES GmbH; Pfungstadt Germany
Presented at ICALEO 2005

Micro machining with the laser requires very small spots. The focus is often in the range of below 10 micron. With standard beam diagnostic systems it is difficult to observe this tool of the processing. Often these processes are designed to operate in the UV. Standard CCD camera systems are only optimized to measure visible radiation at a low power level. Goal of this presentation is to demonstrate which effects have to be taken into account to run a successful measurement of the focus of a high power beam in this microscopic range at a wavelength shorter than 400 nm. Some of the items to be discussed are: The spectral sensitivity of the CCD and radiation induce damage; Direct usage of CCD or fluorescence conversation; The transmission within the optical beam path of the measuring device; integrated mechanical set-up and data transmission for a fast caustic measurement; These are some basics for an industrial diagnostics of UV ? lasers. A possible solution ? a new camera based focal diagnostic system is presented. This system enables to measure the power density distribution of UV-laser spots down to several microns.