Product Code: ICA12_N401

Plasmon-Assisted Nanolithography Exposed by Femtosecond Laser Beam Through Gold Nanostructured Photomasks - Invited Presentation - 30 Minute Presentation
Authors:
Kosei Ueno, Research Institute for Electronic Science, Hokkaido Univ., PRESTO-JST; Sapporo Japan
Hiroaki Misawa, Research Institute for Electronic Science, Hokkaido Univ.; -
Presented at ICALEO 2012

Advanced lithography systems, such as ArF immersion lithography, have achieved a 32 nm node and are already used in the development of electronic device. However, the advanced lithography systems are not suitable for fabricating nanostructures, such as rectangular cuboids, triangular prisms, chains, and nanogaps. These nanostructures are being used for various applications that include plasmonic solar cells and photonic crystal lasers. Here, we report on a novel plasmon-assisted nanolithography system that is used to fabricate nano-patterns with nanometric accuracy. The most attractive merit of this system is to form deep nano-patterns on positive photoresist. The formed nano-patterns are completely reflected in the photomask"s design. The key technology is the two-photon-induced reaction of a photoresist promoted by plasmonic near-field light and propagating light in a photoresist film. This propagating light is a radiation mode from a higher order of localized surface plasmon resonances scattered by gold nanostructures. The system does not induce nano-pattern deformation at the time of mask release. This system presents a simple alternative for producing nano-patterns instead of using nanoimprinting.