Product Code: ICA11_N102

Non-Thermal Ablation of Graphite by Ultrashort Pulsed fs-Laser Radiation
Authors:
Martin Reininghaus, Chair for Laser Technology, RWTH Aachen University; Aachen Germany
Johannes Finger, Chair for Laser Technology, RWTH Aachen University; -
Olga Faley, Chair for Laser Technology, RWTH Aachen University; -
Dirk Wortmann, Chair for Laser Technology, RWTH Aachen University; -
Christoph Stampfer, Institute of Physics B, RWTH Aachen University; -
Presented at ICALEO 2011

We will present results of studies on a novel fs-laser induced ablation mechanism, which in literature is denoted as athermal or non-thermal and includes no melting or evaporation processes. This non-thermal ablation process is capable for solids where the atomic bond strength normal to the surface is significantly different to those in lateral direction. One example for such a solid is given by graphite. In graphite the Carbon atoms of a single graphene layer are bond covalently and thus exhibiting a bond strength of 4 eV per atom. In contrast, the interlayer bond strength normal to the surface results of the more than two orders of magnitude weaker Van-der-Waals-interaction. Without influencing the strong layer internal sp2-bonds this ablation process only breaks the weak Van-der-Waals bonds between the layers resulting in a spalation dynamic of the topmost intact graphene layers from the surface of the HOPG target. Maintaining the internal sp2 crystalline structure of the ablated graphene layers this non-thermal ablation process is feasible to transfer thin layers of sandwich structured solids on various substrates, conserving their mechanical and electronic properties.

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