Product Code: ICAL09_N101

Flying Plasmonic Lens at Near Field for High Speed Nano-Lithography (Invited Presentation, 40 minutes)
Authors:
Liang Pan, SINAM Center at UC Berkeley; Berkeley CA USA
Peter Park, SINAM Center at UC Berkeley; Berkeley CA USA
Yi Xiong, SINAM Center at UC Berkeley; Berkeley CA USA
Erick Ulin-Avila, SINAM Center at UC Berkeley; Berkeley CA USA
Li Zeng, SINAM Center at UC Berkeley; Berkeley CA USA
Cheng Sun, NSF (NSEC), Department of Mechanical Engineering; - USA
David B. Bogy, SINAM Center at UC Berkeley; Berkeley CA USA
Xiang Zhang, SINAM Center at UC Berkeley; Berkeley CA USA
Presented at ICALEO 2009

The Center for Scalable and Integrated NAno-Manufacturing (SINAM) was established through the National Science Foundations (NSF) Nano-scale Science and Engineering Centers (NSEC) program. Under the vision of a new nanotechnology manufacturing paradigm combining fundamental scientific research with industrial outlook, SINAM is developing high-throughput, large scale nano-manufacturing tools through the collective effort of its exceptional interdisciplinary team. One challenge in the commercialization of nanoscale devices is the development of a high-throughput nano-fabrication technology that allows frequent and easy design changes. Maskless nanolithography, such as electron-beam and scanning-probe-lithography, offers the desired flexibility but suffers from low throughput. SINAM has proposed and demonstrated a new low-cost high-throughput approach to maskless nanolithography that uses an array of plasmonic lenses which can fly at high speed above the surface to be patterned, concentrating short wavelength surface plasmons into sub-100 nm spots for photolithography. A self-spacing air-bearing was designed, which can fly the array just 20 nm above a disk that is spinning at speeds of 4-12 meter/second to utilize the near field focusing effect. Patterning with a linewidth of 80 nm is experimentally demonstrated. This low-cost nano-fabrication scheme has the potential to achieve throughputs that are two to five orders of magnitude higher than other maskless techniques.